Theoretical Calculation of Different Ion Surface Interaction Parameters of Si Target

Volume 16 , Issue 1 , February 2014 , Pages 37-44

Authors

Sarwar H. Ali 1 ; S. R. Saeed 2

1 Faculty of Science and Educational Science, University of Sulaimani

2 Faculty Education - Chamchamal, University of Sulaimani

DOI logo 10.17656/jzs.10283

Keywords

Abstract


Longitudinal projected range, energy losses, and sputtering yield are calculated of silicon

target that bombarded with inert ion gases such as He, Ne, Ar, Kr, and Xe using SRIM package.

Obtained results show increasing of longitudinal projected range with ion energy and decreasing

with incident ion mass. The energy losses originated by the nuclear and electronic depending on ion

ranges, generally at low ion energy the nuclear stopping power is dominated in comparison with the

electronic stopping power, and the range of domination varies with changing ion species. Further,

the sputtering yield founded, increasing with ion energy up to maximum value then tending to

decrease, as well as it increases with increasing ion incident angle and decreases with decreasing ion

mass.

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  • Published at24 February 2014

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